Microwave Absorption in Electron Cyclotron Resonance Plasma

• 来源期刊: 中国物理快报（英文版）
• 年，卷（期）: 2000,（1）
• 页码范围: 31-33
• 页数: 3页
• 语种: 英文

摘要

The microwave power absorption in electron cyclotron resonance plasma reactor was investigated with a twodimensional hybrid-code. Simulation results indicated that there are two typical power deposition profiles over the entire parameter region: (1) microwave power deposition peaks on the axis and decreases in radial direction,(2) microwave power deposition has its maximum at some radial position, i.e., a hollow distribution. The spatial distribution of electron temperature resembles always to the microwave power absorption profile. The dependence of plasma parameter on the gas pressure is discussed also.