DYE-SENSITIZED PHOTOLYSIS OF o-Cl-HEXAARYLBIIMIDAZOLE AND PHOTOPOLYMERIZATION KINETICS STUDY OF THE LONG WAVE-LENGTH DYE/HEXAARYLBIIMIDAZOLE SYSTEMS

• 来源期刊: 高分子科学（英文版）
• 年，卷（期）: 2000,（6）
• 页码范围: 495-500
• 页数: 6页
• 语种: 英文

摘要

o-Chloro-hexaarylbiimidazole (o-Cl-HABI) can be sensitized efficiently by the dyes 1-ethyl-3'-methyl thiacyanine bromide (C1), 3,3'-diethyl thiacarbocyanine iodide (C2), and cyclopentanone 2,5-bis[2-(1,3-dihydro-1,3,3-trimethyl-2H-indol-2-ylidene)ethylidene] (C3) through electron transfer proceses. When exposed to a xenon lamp (filtered by Pyrex glass),the photosensitive systems composed of o-Cl-HABI and the above dyes can produce free radicals which initiate the polymerization of MMA. The photopolymerization kinetics equation was obtained for the o-Cl-HABI/C2 system, Rp =K [C2]0.75[o-Cl-HABI]0.44[MTA]0.12[MMA]1.0. A comparison of the influence of different dyes on the conversion of MMA photopolymerization was conducted.