SAXS andalysis of interface in organo—modified mesoporous silica

• 作者: BaozhongDon DongWu JunWang YanJunGong YiLiu YuHanSun ZhiHongLi
• 来源期刊: 北京同步辐射装置：英文版
• 学科: 化学
• 关键词: SAXS 小角X射线散射分析 有机中孔硅石 结构分析 界面 负偏差
• 年，卷（期）: 2001,（2）
• 页码范围: 26-29
• 页数: 4页
• 分类号: O613.72

摘要

A small-angle x-ray scattering(SAXS)technique using synchrotron radiation as the x-ray source has been employed to characterize the microstructure of mesoporous silica prepared by one-pot template-directed synthesis methodology.The scattering of pure silica agreed with Porod’s law.the scattering of organomodified mesoporous silica showed a negative deviation from Porod’s law,suggesting that an interfacial layer exists between the pores and silica matrix.It was the organic groups comprising the interface,as shown by ^29Si cross-polarization magic-angle spinning nuclear magnetic resonance imaging (^29Si cp MAS/NMR) and Fourier transform infrared spectroscopy(FTIR),that caused this negative deviation of SAXS intensity from Porod’s law,and the average thichness of the interfacial layer could be deduced from this negative deviation.Copyright 2001 john Wiley and Sons,Ltd.