Formation of the XeI excimer sustained by dielectric barrier discharge in Xe/I2 at low pressure

• 来源期刊: 中国物理（英文版）
• 学科: 物理学
• 关键词: Dielectric barrier discharge plasma XeI excimer fluorescence emission spectrum
• 年，卷（期）: 2002,（6）
• 页码范围: 568-571
• 页数: 4页
• 分类号: O4
• 语种: 英文

摘要

Dielectric barrier discharge is used to study the mechanism of XeI excimer formation in the mixture of Xe and I2 at low pressures (＜1330 Pa). Fluorescence emission in the spectral region of 200-260nm is examined. We report on the characteristics of the 253 nm emission intensity which varied with different total pressure. The results indicate that under the present experimental conditions, electron impact is the major reaction producing the excimer XeI(B), interpreted as Xe++I2- →XeI(B)+ I*, then radiating 253 nm fluorescence from transition B→X. The 253 nm emission increases with the total gas pressure up to a maximum value at a pressure of about 540 Pa, then decreases as the gas pressure is further increased. The 206 nm emission is determined by I* from ionic recombination between Xe+ and I2-. This result differs from previous works under other experimental conditions.