Development of EIPIG Ion Source

• 作者: He Wei Liu Zhanwen Zhao Hongwei Wang Hui Ma Baohua Li Xixia Feng Yucheng
• 来源期刊: 近代物理研究所和兰州重离子加速器实验室年报：英文版
• 学科: 物理学
• 关键词: 离子源 电离真空计 热阴极 电子注入 金属离子 离子注入 电子密度 冷却效果
• 年，卷（期）: 2004,（1）
• 页码范围: 173
• 页数: 1页
• 分类号: O462.1

摘要

<正>A new EIPIG (Electron Injected-Penning Ionization Gauge) ion source is now under developing in IMP. This source aims to produce high intensity metallic ions of 2-3 charge state. To satisfy this requirement, we introduced some innovations based on typical hot cathode penning source in the design of EIPIG, such as injecting electron into the plasma, which increases the density of electrons in the plasma and enhances PIG