渗氮

• 来源期刊: 表面工程：英文版
• 学科: 工学
• 关键词: 渗氮工艺 氧氮化硅 薄膜生长 微波激励等离子体氮化
• 年，卷（期）: 2005,（2）
• 页码范围: 8-10
• 页数: 3页
• 分类号: TG156.82

摘要

Anomalous Leakage Current in Silicon 0xynitride Thin Films Grown by Microwave Excited Nitrogen Plasma Nitridation. Application of the explosive method for creating nitrogen layers； Bright plasma nitriding of ferritic steel with several alloying elements；Cleaning as the most important step towards successful heat treatment