Investigation of the a-Si:H films by using thermal and light-induced annealing treatment in atomic hydrogen atmosphere in H-W-ECR CVD system

• 来源期刊: 中国物理（英文版）
• 关键词: stability of a-Si:H thin film TLAH extended exponential law
• 年，卷（期）: 2005,（7）
• 页码范围: 1457-1464
• 页数: 8页
• 语种: 英文

摘要

To Investigate the stability of hydrogenated amorphous silicon (a-Si:H) films, the thermal and light-induced annealing treatment in an atomic hydrogen atmosphere (TLAH) is carried out by using a new hot-wire-assisted microwave electron-cyclotron-resonance chemical vapour deposition system (H-W-ECR CVD) modified from a conventional microwave electronic cyclotron resonance chemical vapor deposition system (MWECR CVD). In order to compare with the TLAH method, the experiments of thermal annealing, and thermal and light-induced annealing are also performed.Meanwhile, for the purpose of analysing the photoconductivity degradation quantitative, the photoconductivity degradation is assumed to obey the extended exponential law: 1/σph=1/σs-(1/σs-1/σ0)exp[-(t/τ)β], where the extended exponentialβ and the time constant τ are gained by the slope and the intercept of the line according to the linear relationship between In (-ln(σs-1-σ-1ph/σs-1-σ-10)) and Int, deduced from the extended exponential law; the photoconductivity saturation value σs can be obtained by Gaussian fitting according to the relationship between photoconductivity and light-soaking time in the logarithmic coordinate system. The experimental results show that the TLAH can improve the stability, microstructure and opto-electronic properties of the annealed a-Si:H films, obviously decrease their optical band gaps, and remarkably move their photoluminescence spectrum (PL) peaks toward low energies.