Evolution of stress in evaporated silicon dioxide thin films

• 来源期刊: 中国光学快报(英文版)
• 学科: 物理学
• 关键词: 地应力测量 薄膜蒸发 二氧化硅 薄膜沉积 演变 SiO2 稳定状态 空气压缩
• 年，卷（期）: 2010,（1）
• 所属期刊栏目: Thin Films
• 页码范围: 119-122
• 页数: 4页
• 分类号: O484.1 TD311
• 语种: 英文

摘要

The evolution of stress in evaporated SiO_2,used as optical coatings,is investigated experimentally through in situ stress measurement.A typical evolution pattern consisting of five subprocedures(thin film deposition, stopping deposition,cooling,venting the vacuum chamber,and exposing coated optics to the atmosphere) is put forward.Further investigations into the subprocedures reveal their features.During the deposition stage,the stresses are usually compressive and reach a stable state when the deposite...