MOCVD of Molybdenum Sulphide Thin Film Via Single Solid Source Precursor Bis-(Morpholinodithioato-s,s’)-Mo

• 作者: Bidini Taleatu Bolutife Olofinjana Ezekiel Oladele Ajayi Gabriel Egharevba Olumide Akinwunmi
• 来源期刊: 现代物理(英文)
• 学科: 化学
• 关键词: MOLYBDENUM SULPHIDE PRECURSOR Metal Organic Chemical VAPOUR Deposition (MOCVD) Thin Film Characterization
• 年，卷（期）: xdwlyw_2011,（5）
• 页码范围: 341-349
• 页数: 9页
• 分类号: O6

摘要

A single solid source precursor bis-(morpholinodithioato-s,s’)-Mo was prepared and molybdenum sulphide thin film was deposited on sodalime glass using Metal Organic Chemical Vapour Deposition (MOCVD) technique at deposition temperature of 420?C. The film was characterized using Rutherford Backscattering Spectroscopy (RBS), Ultraviolet-Visible Spectroscopy, Four point probe technique, Scanning Electron Mi-croscopy (SEM), X-ray Diffractometry (XRD) and Atomic Force Microscopy (AFM). A direct optical band gap of 1.77 eV was obtained from the analysis of the absorption spectrum. The sheet resistance was found to be of the order of 10P–5P ΩP–1P?cmP–1P. SEM micrographs of the films showed the layered structure of the film with an estimated grain size that is less than 2 μm while XRD indicates parallel orientation of the basal plane to the substrate surface.