Investigation of Capacitively Coupled Argon Plasma Driven by Dual-Frequency with Different Frequency Configurations

• 作者: 宁兆元 虞一青 辛煜 陆文琪
• 来源期刊: 等离子体科学和技术：英文版
• 学科: 工学
• 关键词: 氩等离子体 频率配置 双频率 容性耦合 驱动 耦合等离子体 发射光谱 CCPS
• 年，卷（期）: 2011,（5）
• 页码范围: 571-574
• 页数: 4页
• 分类号: O53|TN943.6
• 语种: 英文

摘要

Low pressure argon dual-frequency （DF） capacitively coupled plasma （CCP） is generated by using different frequency configurations, such as 13.56/2, 27/2, 41/2, and 60/2 MHz. Characteristics of the plasma are investigated by using a floating double electrical probe and optical emission spectroscopy （OES）. It is shown that in the DF-CCPs, the electron temperature Te decreases with the increase in exciting frequency, while the onset of 2 MHz induces a sudden increase in Te and the electron density increases basically with the increase in low frequency （LF） power. The intensity of 750.4 nm emission line increases with the LF power in the case of 13.56/2 MHz, while different tendencies of line intensity with the LF power appear for other configurations. The reason for this is also discussed.