Optical design for EUV lithography source collector
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摘要:
Wolter I collector is the best collector for extreme ultraviolet (EUV) lithography, which has a series of nested mirrors.It has high collection efficiency and can obtain more uniform intensity distribution at the intermediate focus (IF).A new design with the calculation sequence from the outer mirror to the inner one on the premise of satisfying the requirements of the collector is introduced.Based on this concept, a computer program is established and the optical parameters of the collector using the program is calculated.The design results indicate that the collector satisfies all the requirements.