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摘要:
μ-Czochralski technique has been analyzed using two-dimensional crystallization simulator. It is observed that the temperature is relatively uniform in the entire Si region after the laser irradiation because the heat conductivity of the Si region is much higher than that of the underneath SiO2. Grain growth advances from the grain filter to the channel region and continues until it collides with what advances from random nucleation in the channel region. When the initial temperature is high, the random nucleation rarely occurs even under the supercooling condition, and the grain size becomes large. Moreover, it is qualitatively reproduced that the grain size increases as the irradiated energy of the laser irradiation increases.
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篇名 Analysis of μ-Czochralski Technique Using Two-Dimensional Crystallization Simulator
来源期刊 结晶过程及技术期刊(英文) 学科 医学
关键词 μ-Czochralski Technique Two DIMENSIONAL CRYSTALLIZATION SIMULATOR GRAIN Growth GRAIN FILTER GRAIN Size
年,卷(期) 2012,(1) 所属期刊栏目
研究方向 页码范围 12-15
页数 4页 分类号 R73
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μ-Czochralski
Technique
Two
DIMENSIONAL
CRYSTALLIZATION
SIMULATOR
GRAIN
Growth
GRAIN
FILTER
GRAIN
Size
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研究去脉
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结晶过程及技术期刊(英文)
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2161-7678
武汉市江夏区汤逊湖北路38号光谷总部空间
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