Influence of Substrate Bias Voltage on the Properties of Sputtered Aluminum-Scandium Thin Sheets

• 作者: Hans-Werner Zoch Heinz-Rolf Stock Julien Kovac
• 来源期刊: 表面工程材料与先进技术期刊(英文)
• 学科: 物理学
• 关键词: Aluminum-Scandium Alloy MAGNETRON SPUTTERING FREESTANDING Thin Films BIAS Voltage
• 年，卷（期）: bmgcclyxjjsqkyw,（2）
• 页码范围: 115-119
• 页数: 5页
• 分类号: O4

摘要

Thin sheets (20 μm - 30 μm) of an aluminum-scandium alloy were manufactured by magnetron sputtering with a homogeneous thickness distribution. The influence of bias voltage on the sheet properties was investigated. Steel sheets of 100 μm were employed as substrate and were coated in a dc magnetron sputtering unit fitted with a rectangular target of aluminum 2.0 w% scandium master alloy. After deposition, the substrates were dissolved in an oxidizing medium and thus freestanding aluminum-scandium thin films were obtained. The homogeneous thickness was achieved by a reciprocal movement of the substrate. The influence of a radio frequency bias voltage on the coating properties was investigated. The bias voltage resulted in an important coarsening of the columnar structure as well as an increase of the roughness and hardness. Additionally, a low bias voltage could intensively reduce the coating defect density without altering too much the sheet properties.