Fabrication and characterization of sliced multilayer transmission grating for X-ray region

• 来源期刊: 中国光学快报（英文版）
• 年，卷（期）: 2012,（9）
• 页码范围: 6-8
• 页数: 3页
• 语种: 英文
• DOI: 10.3788/COL201210.090501

摘要

To develop high quality dispersion optics in the X-ray region,the sliced multilayer transmission grating is examined.Dynamical diffraction theory is used to calculate the diffraction property of this volume grating.A WSi2/Si multilayer with a d-spacing of 14.3 nm and bi-layer number of 300 is deposited on a superpolished silicon substrate by direct current magnetron sputtering technology.