Flexible subwavelength gratings fabricated by reversal soft UV nanoimprint

• 来源期刊: 中国光学快报（英文版）
• 年，卷（期）: 2012,（9）
• 页码范围: 9-12
• 页数: 4页
• 语种: 英文
• DOI: 10.3788/COL201210.090502

摘要

We present a replication process,named reversal soft ultraviolet (UV) nanoimprint,to fabricate a highaspect-ratio flexible subwavelength grating (SWG) on a polyurethane acrylate (PUA).This nanopatterning technique consists of casting,reversal UV imprint,and dry release.The UV curing process of PUA to avoid pattern collapse is investigated.Revalpha film acts as the supporting and sacrificial layer during the whole process due to its special surface energy property.The free-standing PUA structures with a period of 200 nm and a depth of 350 nm can be automatically released from the Revalpha film by heating.