Chemical Vapour Deposition Graphene Radio-Frequency Field-Effect Transistors

• 来源期刊: 中国物理快报（英文版）
• 年，卷（期）: 2012,（5）
• 页码范围: 205-208
• 页数: 4页
• 语种: 英文
• DOI: 10.1088/0256-307X/29/5/057302

摘要

We report the dc and rf performance of graphene rf field-effect transistors,where the graphene films are grown on copper by using the chemical vapour deposition (CVD) method and transferred to SiO2/Si substrates.Composite materials,benzocyclobutene and atomic layer deposition Al2O3 are used as the gate dielectrics.The observation of n- and p-type transitions verifies the ambipolar characteristics in the graphene layers.While the intrinsic carrier mobility of CVD graphene is extracted to be 1200cm2/V·s,the parasitic series resistances are demonstrated to have a serious impact on device performance.With a gate length of 1 μm and an extrinsic transconductance of 72 mS/mm,a cutoff frequency of 6.6 GHz and a maximum oscillation frequency of 8.8 GHz are measured for the transistors,illustrating the potential of the CVD graphene for rf applications.