Glass homogeneity effect on wavefront aberration in lithography projection lens
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摘要:
Analysis of glass homogeneity using the attaching interferometric data model neglects body distribution.To improve analysis accuracy,we establish the three-dimensional gradient index (GRIN) model of glass index by analyzing fused silica homogeneity distribution in two perpendicular measurement directions.Using the GRIN model,a lithography projection lens with a numerical aperture of 0.75 is analyzed.Root mean square wavefront aberration deteriorates from 0.9 to 9.65 nm and then improves to 5.9 nm after clocking.