Photocuring Behaviors of UV-Curable Perfluoropolyether-Based Fluoropolymers with and without Tertiary Amine

• 作者: Dong-Pyo Kim Jin-Who Hong Jung-Dae Cho
• 来源期刊: 有机高分子材料期刊(英文)
• 学科: 化学
• 关键词: FLUOROPOLYMER PHOTOCURING BEHAVIORS Oxygen Inhibition Photosynergist
• 年，卷（期）: yjgfzclqkyw_2014,（1）
• 页码范围: 6-9
• 页数: 4页
• 分类号: O6

摘要

UV-curable perfluoropolyether (PFPE)-based fluoropolymer (PFPE-DMA) was synthesized and the photocuring behaviors of PFPE-DMA/HDDA systems with and without tertiary triethyl amine (TEA) were investigated using photo-DSC under air and nitrogen atmospheres. Photo-DSC analysis revealed that N2 purging and the presence of TEA mitigated oxygen inhibition in the photopolymerization of the UV-curable free-radical PFPE-DMA/ HDDA system. In addition, TEA synergistically acted as a coinitiator or photosynergist under nitrogen atmosphere, which increased the cure rate and percentage conversion for the photopolymerization of PFPE-DMA/ HDDA. TEA acted as both oxygen scavenger and photosynergist. The results presented here demonstrate that investigating the photocuring behaviors of PFPE-DMA/HDDA systems is very helpful to determine the optimal curing conditions for the PFPE-DMA fluoropolymer.