Influences of Pr and Ta doping concentration on the characteristic features of FTO thin film deposited by spray pyrolysis

• 来源期刊: 中国物理B（英文版）
• 关键词: Pr-doped FTO Ta-doped FTO spray pyrolysis tin oxide thin films double doping
• 年，卷（期）: 2015,（10）
• 页码范围: 107301-1-107301-9
• 页数: 1页
• 语种: 英文
• DOI: 10.1088/1674-1056/24/10/107301

摘要

The Pr and Ta separately doped FTO (10 at.%F incorporated SnO2) films are fabricated via spray pyrolysis. The mi-crostructural, topographic, optical, and electrical features of fl uorine-doped TO (FTO) films are investigated as functions of Pr and Ta dopant concentrations. The x-ray diffraction (XRD) measurements reveal that all deposited films show polycrys-talline tin oxide crystal property. FTO film has (200) preferential orientation, but this orientation changes to (211) direction with Pr and Ta doping ratio increasing. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) anal-yses show that all films have uniform and homogenous nanoparticle distributions. Furthermore, morphologies of the films depend on the ratio between Pr and Ta dopants. From ultraviolet-visible (UV-Vis) spectrophotometer measurements, it is shown that the transmittance value of FTO film decreases with Pr and Ta doping elements increasing. The band gap value of FTO film increases only at 1 at.%Ta doping level, it drops off with Pr and Ta doping ratio increasing at other doped FTO films. The electrical measurements indicate that the sheet resistance value of FTO film initially decreases with Pr and Ta doping ratio decreasing and then it increases with Pr and Ta doping ratio increasing. The highest value of figure of merit is obtained for 1 at.%Ta-and Pr-doped FTO film. These results suggest that Pr-and Ta-doped FTO films may be appealing candidates for TCO applications.