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摘要:
The ultraviolet (UV) band edge photorefractivity of LiNbO3:Zr at 325 nm has been investigated The experimental results show that the resistance against photorefraction at 325 nm is quite obvious but not as strong as that at 351 nm,when the doping concentration of Zr reaches 2.0 mol%.It is reported that the photorefractivity in other tetravalently doped LiNbO3 crystals,such as LiNbO3:Hf and LiNbO3:Sn,is enhanced dramatically with doping concentration over threshold.Here we give an explicit explanation on such seemly conflicting behaviors of tetravalently doped LiNbO3,which is ascribed to the combined effect of increased photoconductivity and the absorption strength of the band edge photorefractive centers.
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篇名 The mechanism of the UV band edge photorefractivity suppression in highly doped LiNbO3∶Zr crystals
来源期刊 光电子快报(英文版) 学科
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年,卷(期) 2017,(6) 所属期刊栏目
研究方向 页码范围 419-422
页数 4页 分类号
字数 语种 英文
DOI 10.1007/s11801-017-7183-6
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光电子快报(英文版)
双月刊
1673-1905
12-1370/TN
16开
天津市南开区红旗南路263号
2005
eng
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1956
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0
总被引数(次)
3395
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