Effect of Radio Frequency Magnetron Sputtering Power on Structural and Optical Properties of Ti6Al4V Thin Films

• 来源期刊: 光子传感器（英文版）
• 关键词: RF magnetron sputtering Ti6Al4V structural properties optical properties.
• 年，卷（期）: 2017,（2）
• 页码范围: 163-170
• 页数: 8页
• 语种: 英文
• DOI: 10.1007/s13320-017-0390-8

摘要

In this research,the effects of target sputtering power on the structure and optical properties of radio frequency (RF) sputtered Ti6Al4V films were investigated.Different sputtering RF powers were used to produce different thicknesses of Ti6Al4V thin films.From the X-ray diffraction,it was found that the Ti6Al4V films had polycrystalline cubic and hexagonal structures and increased films crystallinity and crystalline size with increasing the sputtering power.Atomic forces microscopy (AFM) gave us a nanometric film character,films homogeneity,and surfaces roughness.A higher degree of roughness and average grain size with increasing RF power was exhibited.Band gap and refractive index of Ti6Al4V thin films varied with sputtering RF powers.