Magnetic Properties and Coercivity of MnGa Films Deposited on Different Substrates
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摘要:
MnGa films were grown by magnetron sputtering on thermally oxidized Si (Si/SiO2) and glass substrates.Films grown on single-crystal Si (100) substrate with different underlayers were prepared for comparison.It is found that the Si/SiO2 substrate is more suitable for growing high-coercivity MnGa films than the glass substrate,which is the result of the isolated-island-like growth.A coercivity of 9.7 kOe can be achieved for the 10 nm MnGa films grown on Si/SiO2 substrate at substrate temperature Ts of 450 ℃.Optimized experimental conditions are specified by changing the thickness of the MnGa films and the temperature of the substrates.