Evaporation-assisted patterning beyond random assembly

• 来源期刊: 国家科学评论（英文版）
• 年，卷（期）: 2019,（6）
• 页码范围: 1065-1066
• 页数: 2页
• 语种: 英文
• DOI: 10.1093/nsr/nwz125

摘要

Evaporation of solvent and the resulting fluid motion has been recognized as a simple but robust patterning method to yield self-assembled patterns of non-volatile solutes (e.g.microspheres,nanopartides,bacteria,polymers,proteins,DNA,graphenes,etc.) on plain surfaces [1,2].Such evaporation-assisted patterning could occur at small scales (O(mm2)) by depositing and drying individual drops on surfaces,or at larger scales (O(cm2)) by continuously moving an evaporating meniscus.