Effect of Deposition Potential on Synthesis, Structural,Morphological and Photoconductivity Response of Cu2O Thin Films by Electrodeposition Technique

• 来源期刊: 金属学报（英文版）
• 年，卷（期）: 2019,（9）
• 页码范围: 1065-1074
• 页数: 10页
• 语种: 英文

摘要

The present work describes the effect of deposition potentials on structural,morphological,optical,electrical and photoconductivity responses of cuprous oxide (Cu2O) thin films deposited on fluorine-doped tin oxide glass substrate by employing electrodeposition technique.X-ray diffraction patterns reveal that the deposited films have a cubic structure grown along the preferential (111) growth orientation and crystallinity of the film deposited at-0.4 V is improved compared to the films deposited at-0.2,-0.3 and-0.5 V.Scanning electron microscopy displays that surface morphology of Cu2O film has a well-defined three-sided pyramid-shaped grains which are uniformly distributed over the surface of the substrates and are significantly changed as a function of deposition potential.Raman and photoluminescence spectra manifest that the film deposited at-0.4 V has a good crystal quality with higher acceptor concentration compared to other films.UV-visible analysis illustrates that the absorption of Cu2O thin film deposited at-0.4 V is notably higher compared to other films and the band gap of Cu2O thin films decreases from 2.1 to 2.04 eV with an increase in deposition potential from-0.2 to-0.5 V.The frequency-temperature dependence of impedance analysis shows that the film deposited at-0.4 V has a high conductivity.I-V measurements elucidate that the film deposited at-0.4 V exhibits a good photoconductivity response compared to films deposited in other deposition potentials.