Te-free SbBi thin film as a laser heat-mode photoresist

• 来源期刊: 中国光学快报（英文版）
• 年，卷（期）: 2019,（9）
• 页码范围: 105-108
• 页数: 4页
• 语种: 英文
• DOI: 10.3788/COL201917.093102

摘要

A Te-free binary phase change material SbBi is proposed as a new inorganic photoresist for heat-mode lithography.It shows good film-forming ability (surface roughness ＜1 nm),low threshold power for crystallization (2 mW),and high etching selectivity (15∶1).Line-type,dot-type,and complex pattern structures with the smallest feature size of 275 nm are fabricated on SbBi thin films using a 405 nm diode laser direct writing system.In addition,the excellent grating structures with a period of 0.8 μm demonstrate that thermal interference does not affect the adjacent microstructures obviously.These results indicate that SbBi is a promising laser heat-mode resist material for micro/nanostructure fabrication.