Laser-induced damage threshold in HfO2/SiO2 multilayer films irradiated by β-ray

• 来源期刊: 中国物理B（英文版）
• 关键词: b-ray irradiation HfO2/SiO2 multilayer film residual stress laser-induced damage threshold
• 年，卷（期）: 2019,（2）
• 页码范围: 290-294
• 页数: 5页
• 语种: 英文
• DOI: 10.1088/1674-1056/28/2/024215

摘要

Post-processing can effectively improve the resistance to laser damage in multilayer films used in a high power laser system. In this work, HfO2/SiO2 multilayer films are prepared by e-beam evaporation and then b-ray irradiation is employed as the post-processing method. The particle irradiation affects the laser induced damage threshold (LIDT), which includes defects, surface roughness, packing density and residual stress. The residual stress that is relaxed during irradiation changes from compressive stress into tensile stress. Our results indicate that appropriate tensile stress can improve LIDT remarkably. In view of the fact that LIDT rises from 8 J/cm2 to 12 J/cm2, i.e., 50％ increase, after the film has been irradiated by 2.2×1013/cm2 b-ray, the particle irradiation can be used as a controllable and desirable postprocessing method to improve the resistance to laser induced damage.