Optimization of laser focused atomic deposition by channeling

• 来源期刊: 中国物理B（英文版）
• 关键词: laser focused atomic deposition nano-grating length transition standards channeling
• 年，卷（期）: 2020,（2）
• 页码范围: 196-202
• 页数: 7页
• 语种: 英文
• DOI: 10.1088/1674-1056/ab631c

摘要

Laser focused atomic deposition is a unique and effective way to fabricate highly accurate pitch standards innanometrology. However, the stability and repeatability of the atom lithography fabrication process remains a challenging problem for massive production. Based on the atom–light interaction theory, channeling is utilized to improve the stabil-ity and repeatability. From the comparison of three kinds of atom–light interaction models, the optimal parameters for channeling are obtained based on simulation. According to the experimental observations, the peak to valley height of Cr nano-gratings keeps stable when the cutting proportion changes from 15％to 50％, which means that the channeling shows up under this condition. The channeling proves to be an effective method to optimize the stability and repeatability of laser focused Cr atomic deposition.