Meter-Level Optical Delay Line on a Low-Loss Lithium Niobate Nanophotonics Chip

• 作者: Shining Zhu
• 来源期刊: 中国物理快报（英文版）
• 年，卷（期）: 2020,（8）
• 所属期刊栏目: GENERAL
• 页码范围: 3-4
• 页数: 2页
• 语种: 英文
• DOI: 10.1088/0256-307X/37/8/080102

摘要

Photonic integrated circuit (PIC) technology provides an enabling platform for emerging applications ranging from big data science and artificial intelligence to high sensitivity sensing and quantum information processing.An outstanding challenge in achieving the large-scale photonic integration is to realize low-loss optical waveguides with small radii and high tuning efficiencies on a single photonic chip.Traditionally, silicon-on-insulator (SOI) has been studied as a ma jor material platform for PIC technology because of its mature processing technology and being compatible with CMOS process.