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Thin films comprising nitrogen-doped ultrananocrystalline diamond/hydrogenated amorphous-carbon(UNCD/a-C∶H)composite films were experimentally investigated.The prepared films were grown on Si substrates by the coaxial arc plasma de-position method.They were characterized by temperature-dependent capacitance-frequency measurements in the temperat-ure and frequency ranges of 300-400 K and 50 kHz-2 MHz,respectively.The energy distribution of trap density of states in the films was extracted using a simple technique utilizing the measured capacitance-frequency characteristics.In the measured tem-perature range,the energy-distributed traps exhibited Gaussian-distributed states with peak values lie in the range:2.84×1016-2.73×1017 eV-1 cm-3 and centered at energies of 120-233 meV below the conduction band.These states are generated due to a large amount of sp2-C and π-bond states,localized in GBs of the UNCD/a-C∶H film.The attained defect parameters are accommodating to understand basic electrical properties of UNCD/a-C∶H composite and can be adopted to suppress defects in the UNCD-based materials.
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篇名 Determination of trap density-of-states distribution of nitrogen-doped ultrananocrystalline diamond/hydrogenated amorphous carbon composite films
来源期刊 半导体学报(英文版) 学科
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年,卷(期) 2021,(6) 所属期刊栏目 ARTICLES
研究方向 页码范围 51-57
页数 7页 分类号
字数 语种 英文
DOI 10.1088/1674-4926/42/6/062802
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半导体学报(英文版)
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1674-4926
11-5781/TN
大16开
北京912信箱
2-184
1980
eng
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