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摘要:
Two dimensional transition metal dichalcogenides(TMDCs)have attracted much interest and shown promise in many applications.However,it is challenging to obtain uniform TMDCs with clean surfaces,because of the difficulties in controlling the way the reactants are supplied to the reaction in the current chemical vapor deposition growth process.Here,we report a new growth approach called'dissolution-precipitation'(DP)growth,where the metal sources are sealed inside glass substrates to control their feeding to the reaction.Noteworthy,the diffusion of metal source inside glass to its surface provides a uniform metal source on the glass surface,and restricts the TMDC growth to only a surface reaction while eliminating unwanted gas-phase reaction.This feature gives rise to highly uniform monolayer TMDCs with a clean surface on centimeter-scale substrates.The DP growth works well for a large variety of TMDCs and their alloys,providing a solid foundation for the controlled growth of clean TMDCs by the fine control of the metal source.
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篇名 Dissolution-precipitation growth of uniform and clean two dimensional transition metal dichalcogenides
来源期刊 国家科学评论(英文版) 学科
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年,卷(期) 2021,(3) 所属期刊栏目 RESEARCH ARTICLES
研究方向 页码范围 103-111
页数 9页 分类号
字数 语种 英文
DOI 10.1093/nsr/nwaa115
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国家科学评论(英文版)
月刊
2095-5138
10-1088/N
大16开
北京市
80-671
2014
eng
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