Effect of hydrogen plasma implantation on the micro-structure and magnetic properties of hcp-Co8057Fe4Ir16 thin films

• 作者: Hui Wang Meng Wu Haiping Zhou Bo Zhang Shixin Hu Tianyong Ma Zhiwei Li Liang Qiao Tao Wang Fashen Li
• 来源期刊: 中国物理B（英文版）
• 年，卷（期）: 2021,（5）
• 所属期刊栏目: CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES
• 页码范围: 726-732
• 页数: 7页
• 语种: 英文
• DOI: 10.1088/1674-1056/abe0c3

摘要

We present detailed investigations of structural and static/dynamic magnetic properties of hydrogenated hcp-Co8057Fe4Ir16 soft magnetic thin films.Two different kinds of defects,i.e.,destructive and non-destructive,were demon-strated by controlling the negative bias voltage of the hydrogenation process.Our results show that the structure and magnetic properties of our sample can be tuned by the density of the induced defects.These results provide better under-standing of the hydrogenation effect and thus can be used in the future for materials processing to meet the requirements of different devices.