Narrow vertical beam divergence angle for display applications of 645 nm lasers

• 作者: Yufei Jia Yufei Wang Xuyan Zhou Linhai Xu Pijie Ma Jingxuan Chen Hongwei Qu Wanhua Zheng
• 来源期刊: 中国光学快报（英文版）
• 年，卷（期）: 2021,（10）
• 所属期刊栏目: Lasers, Optical Amplifiers, and Laser Optics
• 页码范围: 44-48
• 页数: 5页
• 语种: 英文
• DOI: 10.3788/COL202119.101401

摘要

We design a 645 nm laser diode (LD) with a narrow vertical beam divergence angle based on the mode expansion layer.The vertical beam divergence of 10.94° at full width at half-maximum is realized under 1.5 A continuous-wave operation,which is the smallest vertical beam divergence for such an LD based on the mode expansion layer,to the best of our knowledge.The threshold current and output power are 1.07 A and 0.94 W,limited by the thermal rollover for the 100 μm wide and 1500 μm long broad area laser,and the slope efficiency is 0.71 W/A.The low coherence device is fabricated with the speckle contrast of 3.6％ and good directional emission.Such 645 nm LDs have promising applications in laser display.