High-Speed Parallel Plasmonic Direct-Writing Nanolithography Using Metasurface-Based Plasmonic Lens

• 作者: Yueqiang Hu Ling Li Rong Wang Jian Song Hongdong Wang Huigao Duan Jiaxin Ji Yonggang Meng
• 来源期刊: 工程（英文）
• 年，卷（期）: 2021,（11）
• 所属期刊栏目: Nanofabrication-Article
• 页码范围: 1623-1630
• 页数: 8页
• 语种: 英文

摘要

Simple and efficient nanofabrication technology with low cost and high flexibility is indispensable for fundamental nanoscale research and prototyping.Lithography in the near field using the surface plasmon polariton(i.e.,plasmonic lithography)provides a promising solution.The system with high stiffness pas-sive nanogap control strategy on a high-speed rotating substrate is one of the most attractive high-throughput methods.However,a smaller and steadier plasmonic nanogap,new scheme of plasmonic lens,and parallel processing should be explored to achieve a new generation high resolution and reliable efficient nanofabrication.Herein,a parallel plasmonic direct-writing nanolithography system is estab-lished in which a novel plasmonic flying head is systematically designed to achieve around 15nm minimum flying-height with high parallelism at the rotating speed of 8-18 m,s-1.A multi-stage metasurface-based polarization insensitive plasmonic lens is proposed to couple more power and realize a more confined spot compared with conventional plasmonic lenses.Parallel lithography of the nanostructures with the smallest(around 26 nm)linewidth is obtained with the prototyping system.The proposed system holds great potential for high-freedom nanofabrication with low cost,such as planar optical elements and nano-electromechanical systems.