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摘要:
The resistive random access memory (RRAM) has stimulated a variety of promising applications including pro-grammable analog circuit,massive data storage,neuromorphic computing,etc.These new emerging applications have huge demands on high integration density and low power consumption.The cross-point configuration or passive array,which offers the smallest footprint of cell size and feasible capability of multi-layer stacking,has received broad attention from the research community.In such array,correct operation of reading and writing on a cell relies on effective elimination of the sneaking current coming from the neighboring cells.This target requires nonlinear Ⅰ-Ⅴ characteristics of the memory cell,which can be realized by either adding separate selector or developing implicit build-in nonlinear cells.The perfor-mance of a passive array largely depends on the cell nonlinearity,reliability,on/off ratio,line resistance,thermal coupling,etc.This article provides a comprehensive review on the progress achieved concerning 3D RRAM integration.First,the authors start with a brief overview of the associative problems in passive array and the category of 3D architectures.Next,the state of the arts on the development of various selector devices and self-selective cells are presented.Key parameters that influence the device nonlinearity and current density are outlined according to the corresponding working principles.Then,the reliability issues in 3D array are summarized in terms of uniformity,endurance,retention,and disturbance.Sub-sequently,scaling issue and thermal crosstalk in 3D memory array are thoroughly discussed,and applications of 3D RRAM beyond storage,such as neuromorphic computing and CMOL circuit are discussed later.Summary and outlooks are given in the final.
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篇名 Resistive switching memory for high density storage and computing
来源期刊 中国物理B(英文版) 学科
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年,卷(期) 2021,(5) 所属期刊栏目 TOPICAL REVIEW — Physics in neuromorphic devices
研究方向 页码范围 29-55
页数 27页 分类号
字数 语种 英文
DOI 10.1088/1674-1056/abe0c4
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中国物理B(英文版)
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1674-1056
11-5639/O4
北京市中关村中国科学院物理研究所内
eng
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