Effect of gas pressure on ion energy at substrate side of Ag target radio-frequency and very-high-frequency magnetron sputtering discharge

• 作者: Weichen NI Chao YE Yiqing YU Xiangying WANG
• 来源期刊: 等离子体科学和技术（英文版）
• 年，卷（期）: 2022,（2）
• 所属期刊栏目: PLASMA TECHNOLOGY
• 页码范围: 162-171
• 页数: 10页
• 语种: 英文

摘要

The effect of gas pressure on ion energy distribution at the substrate side of Ag target radio-frequency(RF)and very-high-frequency(VHF)magnetron sputtering discharge was investigated.At lower pressure,the evolution of maximum ion energy(E)with discharge voltage(V)varied with the excitation frequency,due to the joint contribution of the ion generation in the bulk plasma and the ion movement across the sheath related to the ion transit sheath time Ti and RF period TRF.At higher pressure,the evolution of E-V relationships did not vary with the excitation frequency,due to the balance between the energy lost through collisions and the energy gained by acceleration in the electric field.Therefore,for RF and VHF magnetron discharge,lower gas pressure can have a clear influence on the E-V relationship.