氧氮共渗

• 来源期刊: 表面工程：英文版
• 学科: 工学
• 关键词: 氧氮共渗 腐蚀防护 塑性基 压电记忆材料 热退火处理
• 年，卷（期）: 2005,（1）
• 页码范围: 16-17
• 页数: 2页
• 分类号: TG174.451

摘要

[ 篇名 ] 3-inch full-color OLED display using a plastic substrate, [篇名] A significant improvement in memory retention of MFIS structure for 1T-type ferroelectric memory by rapid thermal annealing, [ 篇名 ] Accurate reliability evaluation of non-uniform ultrathin oxynitridc and high-k layers, [ 篇名 ] Advanced gate dielectric materials for sub-100 nm CMOS, [篇名 ] AIN films cpitaxialy formed by direct nitridation of sapphire using aluminum oxynitridc as a buffer layer, [ 篇名 ] Amorphous silicon-oxynitridc submicron fibres, [ 篇名 ] Characteristics of Cr-Al-N-O thin films prepared by pulsed laser deposition.