氧氮共渗

• 来源期刊: 表面工程：英文版
• 学科: 工学
• 关键词: 氧氮共渗 氮氧化硅 ECR等离子体 薄膜沉降
• 年，卷（期）: bmgcywb,（2）
• 页码范围: 14-16
• 页数: 3页
• 分类号: TG156.82

摘要

Characteristics of silicon oxynitrides made by ECR plasmas； Characterization and comparison of PECVD silicon nitride and silicon oxynitride dielectric for MIM capacitors；Characterization of silicon oxynitride thin films deposited by ECR-PECVD； Characterization of silicon oxynitrides and high-k dielectric materials by angle-resolved X-ray photoelectron spectroscopy