M-X Ray of Ta Excited by Highly Charged Ar and Xe Ions

• 作者: Chen Ximeng Li Fuli Xiao Guoqing Yang Zhihu Zhan Wenlong Zhang Xiaoan Zhang Yanping ZhaoYongtao
• 来源期刊: 近代物理研究所和兰州重离子加速器实验室年报：英文版
• 学科: 物理学
• 关键词: 高电荷态离子 X射线激发 氙气 钽 AR ECR离子源 X射线谱 氩离子
• 年，卷（期）: 2005,（1）
• 页码范围: 118-119
• 页数: 2页
• 分类号: O562.5

摘要

<正>The X-ray spectra induced by the highly charged xenon and argon ions impinging on a tantalum surface are reported. The experiment was done at the ECR ion source of H1RFL. It is found that the yield of the tantalum M-X rays increases intensively as the projectile kinetic energy increasing. Moreover, the tantalum M-X ray induced by the xenon ions is higher in energy and broader in width than that induced by the argon ions (as shown in Figs. 1 and 2).