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摘要:
The results of the investigation of conduction mechanism of silicate glass doped by oxide compounds of ruthenium (thick film resistor) are reported. The formation of diffusion zones in the softened glass during firing process of the mixture of the glass and the dopant powders is considered. As the result the doping glass becomes conductive. These diffusion zones have higher conductivity and act as percolation levels for the free charge carriers. The effect of tem-perature and duration of firing process on the conductivity of doped glass is considered. Experimental results are in a good agreement with the model.
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篇名 On the Conduction Mechanism of Silicate Glass Doped by Oxide Compounds of Ruthenium (Thick Film Resistors)
来源期刊 凝固态物理国际期刊(英文) 学科 化学
关键词 Lead-Silicate Glass THICK Film Resistors PERCOLATION Levels Doping Conductivity FIRING Conditions
年,卷(期) 2011,(2) 所属期刊栏目
研究方向 页码范围 19-23
页数 5页 分类号 O6
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Lead-Silicate
Glass
THICK
Film
Resistors
PERCOLATION
Levels
Doping
Conductivity
FIRING
Conditions
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研究来源
研究分支
研究去脉
引文网络交叉学科
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期刊影响力
凝固态物理国际期刊(英文)
季刊
2160-6919
武汉市江夏区汤逊湖北路38号光谷总部空间
出版文献量(篇)
215
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0
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0
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