Bragg-Angle Diffraction in Slant Gratings Fabricated by Single-Beam Interference Lithography

• 作者: Shengfei Feng Tianrui Zhai Xinping Zhang
• 来源期刊: 光学与光子学期刊(英文)
• 学科: 物理学
• 关键词: Slant Grating SINGLE-BEAM Interference LITHOGRAPHY Bragg-Angle DIFFRACTION
• 年，卷（期）: 2012,（1）
• 页码范围: 13-16
• 页数: 4页
• 分类号: O43

摘要

A single-beam interference-lithography scheme is demonstrated for the fabrication of large-area slant gratings, which requires exposure of the photoresist thin film spin-coated on a glass plate with polished side-walls to a single laser beam in the ultraviolet and requires small coherence length of the laser. No additional beam splitting scheme and no adjustments for laser-beam overlapping and for optical path-length balancing are needed. Bragg-angle diffractions are observed as strong optical extinction that is tunable with changing the angle of incidence. This device is important for the design of efficient filters, beam splitters, and photonic devices.