Probe and Emission Spectrometry Diagnostics in Hollow Cathode Magnetron

• 作者: A. G. Evstigneev I. A. Kamyschov I. I. Usatov N. P. Poluektov Yu P. Tsar’gorodsev
• 来源期刊: 现代物理(英文)
• 学科: 物理学
• 关键词: HOLLOW CATHODE MAGNETRON Ionized Physical Vapor DEPOSITION
• 年，卷（期）: 2012,（10）
• 页码范围: 1494-1502
• 页数: 9页
• 分类号: O53

摘要

This paper deals with the characterization of an ionized physical vapor deposition (IPVD) by means of hollow cathode magnetron. Langmuir probe, optical emission spectroscopy measurements were used to study a mechanism for the production of excited argon and copper atoms and ions. The kinetic processes of excitation were considered and the main processes were determined using results of measurements. The pressure range is 0.5 - 10 mTorr with 1- 5 kW discharge power. Plasma parameters such as electron densities and temperatures, electron energy distribution function, plasma space and floating potentials as a function of the position, pressure and power in the growth chamber were measured. The plasma density is up to 1012 cm?3 at 20 cm from the magnetron for 10 mTorr.