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摘要:
To determine the nucleation region location of Si nano-crystal grains, pulsed laser ablation of Si target is performed in Ar gas of 10 Pa at room temperature with laser fluence of 4 J/cm2, the substrates are located horizontal under ablation spot with different vertical distance. Characteristics of deposited grains are described by scanning electron microscopy, Raman scattering and X-ray diffraction spectra, the results indicate that deposition position on substrates in a certain range is relative to target surface, which changes according to different vertical distance of substrates to ablation spot. Grain size increased?at first and then decreased with addition of lateral distances to target in the range, but the integral distribution rule was independent of position of substrates. Combining with hydrodynamics model, nucleation division model, thermokinetic equation and flat parabolic motion, spatial nucleation region location of grains is obtained through numerical calculations, which is 2.7 mm-43.2 mm to target surface along the plume axis.
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篇名 Determination of the Nucleation Region Location of Si Nano-Crystal Grains Prepared by Pulsed Laser Ablation through Changing Position of Substrates
来源期刊 表面工程材料与先进技术期刊(英文) 学科 医学
关键词 NUCLEATION REGION LOCATION SI NANO-CRYSTAL Grains Pulsed Laser Ablation
年,卷(期) 2013,(2) 所属期刊栏目
研究方向 页码范围 133-137
页数 5页 分类号 R73
字数 语种
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研究主题发展历程
节点文献
NUCLEATION
REGION
LOCATION
SI
NANO-CRYSTAL
Grains
Pulsed
Laser
Ablation
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期刊影响力
表面工程材料与先进技术期刊(英文)
季刊
2161-4881
武汉市江夏区汤逊湖北路38号光谷总部空间
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211
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0
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