The Design and Manufacturing of Diffraction Optical Elements to form a Dot-Composed Etalon Image within the Optical Systems

• 作者: Hike Rafaelovich Sagatelyan Sergey Borisovich Odinokov
• 来源期刊: 光学与光子学期刊(英文)
• 学科: 物理学
• 关键词: Optical Glass Plasma-Chemical ETCHING SELECTIVITY DIFFRACTION GRATINGS MICRO-OPTICS
• 年，卷（期）: 2013,（1）
• 页码范围: 102-111
• 页数: 10页
• 分类号: O43

摘要

The possibilities of manufacturing of diffraction optical elements (DOE), using the “Caroline 15 PE” plasma-etching machine were considered. It is established that at thickness of chromic mask of 100 nm the plasma-chemical etching (PCE) method reaches depth of surface micro-profile to 1.4 μm on optical glass. It allows increasing the diffraction efficiency of DOE to 0.3 - 0.35 on the second order of diffraction.