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摘要:
Piezoresistive pressure sensors based on silicon have a large thermal drift because of their high sensitivity to temperature. The study of the effect of the temperature and doping level on characteristics of these sensors is essential to define the parameters that cause the output characteristics drift. In this study, we adopted the model of Kanda to determine the effect of the temperature and of doping level on the piezoresistivity of the Silicon monocrystal. This is to represent P(N,T) and for p-type silicon as functions of impurity concentration for different temperatures. This allows us to see the effect of temperature and doping concentration on the output characteristics of the sensor. Finally, we study the geometric influence parameters and doping on these characteristics to optimize the sensor performance. This study allows us to predict the sensor behavior against temperature and to minimize this effect by optimizing the doping concentration.
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篇名 The Effect of Temperature and Doping Level on the Characteristics of Piezoresistive Pressure Sensor
来源期刊 传感技术(英文) 学科 医学
关键词 THERMAL DRIFT Pressure PIEZORESISTIVITY PIEZORESISTIVE COEFFICIENTS SENSOR
年,卷(期) 2014,(2) 所属期刊栏目
研究方向 页码范围 59-65
页数 7页 分类号 R73
字数 语种
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研究主题发展历程
节点文献
THERMAL
DRIFT
Pressure
PIEZORESISTIVITY
PIEZORESISTIVE
COEFFICIENTS
SENSOR
研究起点
研究来源
研究分支
研究去脉
引文网络交叉学科
相关学者/机构
期刊影响力
传感技术(英文)
季刊
2161-122X
武汉市江夏区汤逊湖北路38号光谷总部空间
出版文献量(篇)
114
总下载数(次)
0
总被引数(次)
0
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