Simple General Purpose Ion Beam Deceleration System Using a Single Electrode Lens

• 作者: J. Lopes J. Rocha
• 来源期刊: 世界工程和技术(英文)
• 学科: 医学
• 关键词: DECELERATION Low Energy POSITIVE Ion BEAM
• 年，卷（期）: 2015,（3）
• 页码范围: 127-133
• 页数: 7页
• 分类号: R73

摘要

Ion beam deceleration properties of a newly developed low-energy ion beam implantation system were studied. The objective of this system was to produce general purpose low-energy (5 to 15 keV) implantations with high current beam of hundreds of μA level, providing the most wide implantation area possible and allowing continuously magnetic scanning of the beam over the sample(s). This paper describes the developed system installed in the high-current ion implanter at the Laboratory of Accelerators and Radiation Technologies of the Nuclear and Technological Cam-pus, Sacavém, Portugal (CTN).