6-15 Plasma Discharge for In-situ Cleaning of SRF Cavities

• 作者: Chu Qingwei Guo Hao He Yuan Jiang Tiancai Li Chunlong Li Yongming Song Yukun Wu Andong Xiong Pingran Yang Lei You Zhiming Yue Weiming Zhang Shenghu Zhang Shengxue Zhao Hongwei
• 来源期刊: 中国科学院近代物理研究所和兰州重离子研究装置年报：英文版
• 学科: 物理学
• 年，卷（期）: 2016,（1）
• 页码范围: 264-264
• 页数: 1页
• 分类号: O4

摘要

Field emission occurred in superconducting radio-frequency(SRF)cavities is the major obstacle of the accelerators operating at high gradient,which partly caused by the inner surface contamination,such as the hydrocarbons and the absorbed residual gas.The plasma processing can be an effective method to solve the field emission issues.The properties of low temperature glow discharge,which was argon plasma with the chemically reactive oxygen,were investigated for the SRF cavities used for CADS project.