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摘要:
The temperature and flow rate control of diffusing chamber is one of the key technologies in the production of poly-crystal silicon thin film. As there exist some modeling uncertainties and errors in the actual system, it is difficult to guarantee the chamber variable temperature conditions and the flow rate of diffusion gas being controlled within its targeted range in the rapid thermal processing (RTP). In this paper, the control applies the programmable logic controller (PLC) to configure control hardware system, proposes expert proportional integral derivative (PID) control method to regulate the gas flow rate and H∞ control strategy to attenuate chamber modeling uncertainties and disturbances, respectively, to steer the chamber rapid variable temperature very close to the expected product temperatures. Furthermore, it designs human-machine integrated user control interface (HMI) and achieves rapid and accurately control performances for user operating production. The designed control system are simulated and tested in the application, which demonstrates that the control method has strong robustness when the modeling uncertainties, errors, parameters perturbation and disturbances, the temperature and flow rate meet the requirements of precisely trajectory following.
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篇名 Temperature and Flow Rate Control of Diffusing Chamber
来源期刊 世界工程和技术(英文) 学科 医学
关键词 Diffusing CHAMBER PLC HARDWARE Configuring EXPERT PID CONTROL H∞ CONTROL HMI
年,卷(期) 2017,(1) 所属期刊栏目
研究方向 页码范围 58-76
页数 19页 分类号 R73
字数 语种
DOI
五维指标
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研究主题发展历程
节点文献
Diffusing
CHAMBER
PLC
HARDWARE
Configuring
EXPERT
PID
CONTROL
H∞
CONTROL
HMI
研究起点
研究来源
研究分支
研究去脉
引文网络交叉学科
相关学者/机构
期刊影响力
世界工程和技术(英文)
季刊
2331-4222
武汉市江夏区汤逊湖北路38号光谷总部空间
出版文献量(篇)
482
总下载数(次)
0
总被引数(次)
0
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