Laser-Driven Light Sources for Nanometrology Applications

• 作者: Huiling Zhu Paul Blackborow
• 来源期刊: 微电子制造学报
• 学科: 工学
• 关键词: LASER-DRIVEN BRIGHTNESS BROADBAND deep-UV METROLOGY LDLS
• 年，卷（期）: 2019,（1）
• 页码范围: 27-31
• 页数: 5页
• 分类号: TN

摘要

Laser-driven light sources(LDLS)have ultrahigh-brightness and broad wavelength range.They are ideal radiation sources for optical metrology tools for advanced process control in semiconductor manufacturing.LDLS sources,with their advantages of 170 nm to 2100 nm wavelength range,have been widely adopted and are being used in volume manufacturing for spectroscopic ellipsometry(SE),spectroscopic scatterometry(SS),and white light interferometry(WLI)applications.Such applications are used to measure critical dimensions(CD),overlay(OVL),and film thickness.