Impact Thickness on Structural and Electrical Characterization of Nickel Phthalocyanine Thin Films

• 作者: Addnan H. Al-Aarajiy Eman M. Nasir Mohammed T. Hussein
• 来源期刊: 材料物理与化学进展(英文)
• 学科: 物理学
• 关键词: Nickel PHTHALOCYANINE VACUUM EVAPORATION XRD AFM Morphology THIN Film ELECTRICAL Properties
• 年，卷（期）: 2019,（7）
• 页码范围: 123-132
• 页数: 10页
• 分类号: O4

摘要

Thin films of Nickel Phthalocyanine have been prepared by evaporation technique for (50 - 350 nm) of thickness. XRD studies show that the thin films have single crystalline structure for low thicknesses with (100) orientation and the crystallite size increased with increased thickness. Also from the AFM technique for NiPc films, the roughness was determined and the grain size increases with increasing of thickness from except at thickness 350 nm. The studies of electrical properties, morphology and orientations of the crystallites are important to understand and predict the nature of the films and essential for their successful applications in solar cell and sensors. The electrical properties of these films were studied with different thickness, NiPc has three activation energy. Carrier’s concentration and mobility was calculated. Hall measurements showed that all the films are p-type.