Atomic layer deposition enabling higher efficiency solar cells:A review

• 来源期刊: 纳米材料科学（英文版）
• 年，卷（期）: 2020,（3）
• 页码范围: 204-226
• 页数: 23页
• 语种: 中文

摘要

Atomic layer deposition(ALD)can synthesise materials with atomic-scale precision.The ability to tune the material composition,film thickness with excellent conformality,allow low-temperature processing,and in-situ real-time monitoring makes this technique very appealing for a wide range of applications.In this review,we focus on the application of ALD layers in a wide range of solar cells.We focus on industrial silicon,thin film,organic and quantum dot solar cells.It is shown that the merits of ALD have already been exploited in a wide range of solar cells at the lab scale and that ALD is already applied in high-volume manufacturing of silicon solar cells.